Low-temperature activation process

In order to maximize the characteristics of oxide semiconductors, we are researching a low-temperature activation process in contrast to the existing high-temperature thermal treatment process. It is difficult to apply to the polymer substrate materials for stretchable/ultra-thin electronic devices through the high-temperature thermal treatment process. To solve this problem, we are using various energy sources such as electron beams and deep ultraviolet lights.

Electron beam annealing(EBA) process

Deep-ultraviolet/Thermal dual treatment(DTT) process